A fully automated optical imaging system for semiconductor research and advanced materials. With an optional SMAL objective, the Nanoro M can image lateral features below 100 nm, depending on the sample and configuration.
LIG Nanowise Nanoro M microscope.
See more across a sample
The precision scanning stage and stitching software can assemble images across larger sample areas. The system supports imaging from standard objectives through to optional SMAL super-resolution objectives.
Animated demonstration of wide-area scanning and image stitching.
Optional super-resolution With an appropriate SMAL objective, the system can resolve lateral features below 100 nm, depending on the sample and imaging conditions.
Full-colour imaging 12 MP CMOS camera, 4000 × 3000 pixels, up to 60 frames per second and USB 3.0 connectivity.
White-light illumination Variable-output cold-white LED illumination across a stated 400–700 nm range.
Non-destructive workflow Optical imaging lets users examine samples without the vacuum environment used by electron microscopes.
Imaging examples
The manufacturer’s demonstration shows fine sample features that were independently measured by SEM at 66 nm. This is an example result, not a guaranteed resolution for every sample.
Example SMAL imaging result. Results depend on the sample and objective configuration.Wavelength selectivity can help bring a sample region into focus at the wavelength of interest.
System specifications
Camera
Full-colour Bayer CMOS; 12 MP; 4000 × 3000 pixels; up to 60 fps; USB 3.0.
Illumination
Variable-output cold-white LED; stated illumination range 400–700 nm; typical source lifetime stated as 100,000 hours.
Objective turret
Manual turret supporting four lenses; M25 connection. Standard lens support includes 10×, 40×, 100× and SMAL options. Other air and immersion objectives are available to confirm.
XY stage
50 mm travel for sample scanning, with encoder feedback and crossed-roller bearings.
Z stage
60 mm travel; 100 nm minimum movement stated.
Software
Live viewing, area scans, stitching, measurement tools, distance calibration, autofocus for supported objectives, wavelength and iris control, image metadata and configurable image export.
Scanning and stitching
The specification lists up to 1,600 mm² accessible scan area and up to 64 mm² stitched image area, subject to file and acquisition limits.
Approximate size and weight
Microscope: 30 × 40 × 60 cm, 24 kg. Controller: 27 × 60 × 65 cm, 19 kg.
Choose the Nanoro M package
Package
Order code
Included configuration
Complete Nanoro M system
NANO-001
Microscope, controller and software; one-year return-to-base warranty; 10×, 40× and 100× objectives; two SMAL immersion lenses with four refurbishments; monitor, case, cables, keyboard and mouse; three-axis movement control with integrated software support.
Microscope and controller
NANO-002
Basic Nanoro M microscope and controller, with one-year return-to-base warranty. Additional parts are not included.
Who may benefit?
Nanoro M is designed for semiconductor research and advanced materials imaging. It may also suit work involving microelectronics, coatings, metals and other samples where optical contrast, colour information and non-destructive examination are useful. Our team can discuss your sample and imaging goals before you choose a configuration.
Price on application
Tell us about your sample, required resolution, preferred objective and system package. We can confirm the suitable configuration and provide a quotation. Request a quote from Auckland Scientific.
Specifications and performance depend on the selected configuration and sample. Manufacturer specifications may change. Scan speed varies with acquisition settings. Installation and training can be quoted separately.
