AUC-460-NIR Near-Infrared Wafer Inspection Microscope
£65,995.00
Sale price
£65,995.00
Regular price
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AUC-460-NIR Near-Infrared Wafer Inspection Microscope
£65,995.00
Sale price
£65,995.00
Regular price
NEAR-INFRARED WAFER INSPECTION
AUC-460-NIR Near-Infrared Wafer Inspection Microscope
Reveal internal features in silicon and germanium wafers, packaged devices and semiconductor components using near-infrared imaging.
The AUC-460-NIR is a complete industrial microscope imaging system designed for near-infrared inspection and conventional bright-field viewing. Its wide-spectrum illumination, dedicated NIR objectives and camera system support non-destructive examination of structures that are difficult to see with visible light alone.
Typical applications
Wafer and packaged-chip inspection, CSP/SIP package analysis, MEMS devices, silicon and germanium samples, and semiconductor failure investigation.
Imaging and optical performance
- Dedicated NIR objectives: 5×, 10×, 20× and 50× plan semi-apochromatic objectives, corrected from visible into near-infrared wavelengths (450–1700 nm).
- Correction collars: 0–1.2 mm on the 20× and 50× objectives to compensate for sample layer thickness.
- Standard camera: 3.2 MP monochrome NIR camera, 400–1100 nm, up to 120 fps at 2064 × 1544 pixels, with 3.45 μm pixels.
- NIR filters: 1100 nm band-pass filter included; 1200 nm and 1300 nm filters are optional.
- Illumination: Bright-field and NIR reflected modes, with an electrically controlled aperture diaphragm that adjusts with objective magnification.
- Motorised nosepiece: Sextuple bright-field nosepiece with DIC slot and powered forward/reverse objective selection.
Standard specification
| Optical system | Infinity colour-corrected optical system |
|---|---|
| Viewing head | 30° tilting NIR trinocular head; erect image; 50–76 mm interpupillary distance; 100:0 or 0:100 light split |
| Eyepieces | High-eyepoint PL10×/23 mm plan eyepieces with adjustable dioptre |
| Objectives | 5× NA 0.15, WD 19.5 mm; 10× NA 0.30, WD 12.2 mm; 20× NA 0.45, WD 7.31–7.57 mm; 50× NA 0.70, WD 2.68–2.93 mm |
| Stage | 12 × 14 inch three-layer mechanical stage; 420 × 718 mm stage size; 305 × 356 mm movement; quick-movement clutch; metal plate for reflected use |
| Focus and frame | Low-position coaxial focus; 35 mm coarse range; 0.001 mm fine-focus precision; 100–240 V power system |
| Camera adapter | Adjustable-focus 1× C-mount adapter |
Software and supplied system
The stated system includes a desktop PC with a 23.8-inch monitor, MvImage-Industry software and dongle, and a 0.01 mm stage micrometer. Software functions include live image capture, still images and video, exposure and image adjustments, Z-stack and timed capture, measurement and scale annotation, edge measurement, and image enhancement. The software can also control supported electrical microscope functions.
Available options
- 1.3 MP NIR grayscale camera with sensitivity extending to 1700 nm.
- 1200 nm or 1300 nm NIR band-pass filters.
- Glass stage plate for transmitted and reflected work.
- Rotating wafer stage for 6, 8 or 12 inch wafer trays.
- Alternative eyepieces and measuring reticles.
Auckland Scientific 3-year warranty
Supplied with an Auckland Scientific 3-year warranty (conditions apply).
Need help choosing the right configuration?
Call Auckland Scientific to discuss your sample, wafer size, imaging wavelength and inspection requirements. We can help you select the appropriate camera, filters and stage options.
Vibration control for precision wafer inspection
A stable support can help with vibration-sensitive inspection and imaging workflows.
Explore vibration isolation systems and optical breadboards and tabletops.